A high purity material used as a source for sputtering, a cold vaporization process in which atoms are physically removed from the target surface by ion bombardment.
Goodfellow Corp.
6.45 Millimeter (mm) Thickness and 76.2 Millimeter (mm) Diameter Boron Carbide (B4C) Hot-Pressed Sputtering Target
$0.00
Reviews
There are no reviews yet.