A high purity material used as a source for sputtering, a cold vaporization process in which atoms are physically removed from the target surface by ion bombardment.

Goodfellow Corp.
3 Millimeter (mm) Thickness and 50 to 76.2 Millimeter (mm) Diameter Boron Carbide (B4C) Hot-Pressed Sputtering Target
$0.00
Reviews
There are no reviews yet.