A high purity material used as a source for sputtering, a cold vaporization process in which atoms are physically removed from the target surface by ion bombardment.
Goodfellow Corp.
1.5 Millimeter (mm) Thickness Silicon Carbide (SiC) Hot-Pressed Sputtering Target
$0.00
Related products
-
Goodfellow Corp.
300 Micrometer (µm) Maximum Particle Size Polyethylene Terephthalate Powder
$0.00 Add to cart -
-
Reviews
There are no reviews yet.